Reactive deposition of device quality conformal copper films from supercritical CO2

Advanced Metallization Conference (AMC)

Volumn , Issue , 2001, Pages 177-183

  Blackburn, J M ^a   Cabanas, A ^a   Zong, Y ^a   Quinn, J D ^a   Watkins, J J ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CATALYSIS; COPPER; DEPOSITION; ETCHING; SOLUBILITY; SUPERCRITICAL FLUIDS; WSI CIRCUITS;

REACTIVE DEPOSITION;

METALLIC FILMS;

EID: 0035555063     PISSN: 10480854     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)