Development of a cluster tool and analysis of deposition of silicon oxide by TEOS/O2 PECVD

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 263-268

  Morimoto, N I ^a   Swart, J W ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; ELLIPSOMETRY; FABRICATION; FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDES; REFRACTIVE INDEX; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; STOICHIOMETRY;

CLUSTER TOOL; INTRINSIC STRESS; RAPID THERMAL ANNEALING CHAMBER; SILICON OXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 0030420915     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-429-263     Document Type: Conference Paper

References (11)