Secondary electron emission of MgO thin layers prepared by the spin coating method

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 4, 2001, Pages 1366-1369

  Lee, Jeonghee ^a   Jeong, Taewon ^a   Yu, SeGi ^a   Jin, Sunghwan ^a   Heo, Jungna ^a   Yi, Whikun ^a   Kim, J M ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; CRYSTAL STRUCTURE; ELECTRON BEAMS; ELECTRON EMISSION; EVAPORATION; FILM PREPARATION; SPIN COATING; SURFACE ROUGHNESS; THIN FILMS; VOLTAGE MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

BIAS VOLTAGE; CRYSTALLINITY; ELECTRON BEAM EVAPORATION; SECONDARY ELECTRON EMISSION;

MAGNESIA;

EID: 0035535279     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1383079     Document Type: Conference Paper

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