Trench pattern lithography for 0.13-μm and 0.10-μm logic devices at 248-nm and 193-nm wavelengths

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 276-292

  Wang, Ying Ying ^a   Lin, Hua Tai ^a   Yu, Shinn Sheng ^a   Chen, Chun Kuang ^a   Ku, Yao Ching ^a   Yen, Anthony ^a   Lin, Burn Jeng ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHTING; LOGIC DEVICES; MASKS; OPTICAL RESOLVING POWER; PHASE SHIFT;

TRENCH PATTERN LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0035758387     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435728     Document Type: Conference Paper

References (2)

1. John. S. Petersen, "Analytical description of antiscattering and scattering bar assist features", Proc. SPIE, vol.4000, pp.77 (2000).
2. Chun-Ming Wang, Shinn-Sheng Yu, and Anthony Yen, "A Study of Pupil Filters for Depth of Focus Enhancement in Printing Contact Holes, Proc. SPIE, vol.3679, pp.783 (1999).