Pattern generators and microcolumns for ion beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3172-3176

  Scott, K L ^c   King, T J ^c   Lieberman, M A ^a   Leung, K N ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DOPING (ADDITIVES); ELECTRODES; MIRRORS; PATTERN RECOGNITION;

ION BEAM COLUMN ARRAYS; SCANNING PROXIMAL PROBES;

ION BEAM LITHOGRAPHY;

EID: 0034318136     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1314384     Document Type: Article

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