Integrated Arc suppression unit for defect reduction in PVD applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3214, Issue , 1997, Pages 33-41

  Li, Xiangbing ^a   Narasimhan, Murali ^a   Pavate, Vik ^a   Loo, David ^a   Rosenblum, Steve ^b   Trubell, Larry ^b   Scholl, Richard ^b   Seamons, Scott ^a   Hagerty, Chris ^a   Ramaswami, Sesh ^a  

^a APPLIED MATERIALS INC   (United States)

^b Advanced Energy Industries Incorporated   (United States)

Author keywords

Arc; Arc suppression; Defect reduction; Dielectric film; PVD; Reactive sputtering; Splats; Target; Yield improvement

Indexed keywords

CABLES; DEFECTS; DIELECTRIC DEVICES; DIELECTRIC FILMS; MICROELECTRONIC PROCESSING; MICROELECTRONICS; PLASMA DEPOSITION; PLASMA STABILITY; PLASMAS; POLARIZATION; TARGETS; TIN; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

ARC; ARC SUPPRESSION; DEFECT REDUCTION; PVD; SPLATS; YIELD IMPROVEMENT;

CAVITY RESONATORS;

EID: 0006766721     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284662     Document Type: Conference Paper

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