Deposition of diamond films at low pressure in a planar large-area microwave surface wave plasma source

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2835-2839

  Yeh, W Y ^a   Hwang, J ^a   Wu, T J ^a   Guan, W J ^a   Kou, C S ^a   Chang, H ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; FILM GROWTH; HIGH PRESSURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SILICON WAFERS; SUBSTRATES; SURFACE WAVES;

OVERDENSE PLASMAS;

DIAMOND FILMS;

EID: 0035507360     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1409378     Document Type: Article

References (20)