Microscopic study of field emission from diamond particles

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 818-823

  Watanabe, Akihiko ^a   Deguchi, Masahiro ^b   Kitabatake, Makoto ^a  

^a Japan Atomic Energy Research Institute   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

Field emission; Micro particle; Morphology; Scanning tunneling microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRON SPECTROSCOPY; FIELD EMISSION MICROSCOPES; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SURFACE PROPERTIES; TUNGSTEN;

MICROWAVE PLASMA;

DIAMONDS;

DIAMOND;

EID: 0035269436     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00588-4     Document Type: Article

References (27)

1. Spitsyn B.V., Boilov L.L., Derjaguin B.V. J. Cryst. Growth. 52:1981;219.
2. Matsumoto S., Sato Y., Kamo M., Setaka N. Jpn. J. Appl. Phys. 21:1982;L183.
3. Kamo M., Sato Y., Matsumoto S., Setaka N. J. Cryst. Growth. 62:1983;642.
4. Himpsel F.J., Knapp J.A., Van Vechten J.A., Eastman D.E. Phys. Rev. B20:1979;624.
5. Pate B.B. Surf. Sci. 165:1986;83.
6. Deguchi M., Kitabatake M., Kurokawa H., Shiratori T. New Diamond Frontier Carbon Technol. 9:1999;144.
7. Wang C., Garcia A., Ingram D.C., Lake M., Koldesch M.E. Electron Lett. 27:1991;1459.
8. Okano K., Gleason K.K. Electron Lett. 31:1995;74.
9. Okano K., Yamada T., Ishihara H., Koizumi S., Itoh J. Appl. Phys. Lett. 70:1997;2201.
10. Sugino T., Iwasaki Y., Kawasaki S., Yokota Y., Hattori R., Shirafuji J. Diamond Relat. Mater. 7:1998;677.
11. Show Y., Matsuoka F., Hayashi M., Ito H., Iwase M., Izumi T. J. Appl. Phys. 84:1998;6351.
12. Huang Z.-H., Cutler P.H., Miskovsky N.M., Sullivan T.E. Appl. Phys. Lett. 65:1994;2562.
13. Bandis C., Pate B.B. Appl. Phys. Lett. 69:1996;366.
14. Zhu W., Kochanski G.P., Jin S., Seibles L. J. Appl. Phys. 78:1995;2707.
15. Lacher F., Wild C., Behr D., Koidl P. Diamond Relat. Mater. 6:1997;1111.
16. Zhirnov V.V., Givargizov E.I., Plekhanov P.S. J. Vac. Sci. Technol. B13:1995;418.
17. Schlesser R., McClure M.T., McCarson B.L., Sitar Z. J. Appl. Phys. 82:1997;5763.
18. Wang W.N., Fox N.A., Steeds J.W., Lin S.R., Butler J.E. J. Appl. Phys. 80:1996;6809.
19. Frolov V.D., Karabutov A.V., Konov V.I., Pimenov S.M., Prokhorov A.M. J. Phys. D32:1999;815.
20. Frolov V.D., Karabutov A.V., Pimenov S.M., Obraztsova E.D., Konov V.I. Ultramicroscopy. 79:1999;209.
21. Gröning O., Küttel O.M., Gröning P., Schlapbach L. J. Vac. Sci. Technol. B17:1999;1064.
22. Gröning O., Küttel O.M., Gröning P., Schlapbach L. J. Vac. Sci. Technol. B17:1999;1970.
23. Kim Y.D., Choi W., Wakimoto H., Usami S., Tomokage H., Ando T. Diamond Relat. Mater. 9:2000;1096.
24. Turner K.F., LeCrice Y.M., Stoner B.R., Glass J.T., Nemanich R.J. J. Vac. Sci. Technol. B9:1991;914.
25. M. Kitabatake, A. Watanabe and M. Deguchi, Proc. ADC/FCT'99, (1999) P-376.
26. S. Kono (private communication).
27. Deguchi M., Mori Y., Eimori N., et al. Proc. 2nd Int. Conf. on Application of Diamond Films and Related Materials 91-8. 1993;793 The Chemical Society, New Jersey.