SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 397, Issue 1-2, 2001, Pages 211-215

Er doping of nanocrystalline-Si/SiO2 superlattices

(7) Schmidt, M a Zacharias, M a Richter, S a Fischer, P a Veit, P a Blasing J a Breeger, B b

a OTTO VON GUERICKE UNIVERSITY (Germany)

b FRIEDRICH SCHILLER UNIVERSITY JENA (Germany)

Author keywords

Rutherford backscattering spectroscopy; Silicon; Superlattices; X Ray diffraction

Indexed keywords

ANNEALING; CRYSTALLIZATION; ERBIUM; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR DOPING; SILICA; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

RADIO FREQUENCY (RF) SPUTTERING;

SEMICONDUCTOR SUPERLATTICES;

EID: 0035499308 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01413-4 Document Type: Article

Times cited : (15)

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