Assessment of dry etching damage in permalloy thin films

Journal of Applied Physics

Volumn 85, Issue 8 II B, 1999, Pages 5992-5994

  Kim, S D ^a   Lee, J J ^a   Lim, S H ^b   Kim, H J ^b  

^a Seoul National University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; COERCIVE FORCE; ION BEAMS; ION BOMBARDMENT; MAGNETIZATION; NICKEL ALLOYS; PLASMA ETCHING; RADIATION DAMAGE; REACTIVE ION ETCHING; SOFT MAGNETIC MATERIALS; SURFACE ROUGHNESS;

ION BEAM ETCHING (IBE); MAGNETIC SOFTNESS; PERMALLOYS;

METALLIC FILMS;

EID: 0032620964     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370014     Document Type: Article

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