Effect of ion energy on photoresist etching in an inductively coupled, traveling wave driven, large area plasma source

Journal of Applied Physics

Volumn 89, Issue 10, 2001, Pages 5318-5321

  Takechi, K ^a,b   Lieberman, M A ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035873509     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1364648     Document Type: Article

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