Formation of narrow grooves on thin metal layer by focused ion beam etching

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 877-882

  Yoshida, M ^a   Murakami, S ^a   Nakayama, M ^a   Yanagisawa, J ^a   Wakaya, F ^a   Kaito, T ^b   Gamo, K ^a  

^a OSAKA UNIVERSITY   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TUNNELING; ETCHING; FERROMAGNETIC MATERIALS; GERMANIUM; ION BEAMS; MAGNETORESISTANCE; TUNNEL JUNCTIONS;

FOCUSED ION BEAM ETCHING;

THIN FILMS;

EID: 0035450642     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00444-0     Document Type: Article

References (5)