Control of the critical dimension with a trilayer nanoimprint lithography procedure

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 411-416

  Lebib, A ^a   Natali, M ^a   Li, S P ^a   Cambril, E ^a   Manin, L ^a   Chen, Y ^a   Janssen, H M ^b   Sijbesma, R P ^b  

^a CNRS   (France)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Critical dimension; Hybrane; Nanoimprint lithography

Indexed keywords

ETCHING; MAGNETOOPTICAL DEVICES; NANOSTRUCTURED MATERIALS; POLYMERS;

CRITICAL DIMENSION (CD); NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0035450085     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00449-X     Document Type: Article

References (7)