Low-temperature deposition of optical films by oxygen radical beam-assisted evaporation

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 92-96

  Yamada, Yasumi ^a   Harada, Takahiro ^a   Uyama, Haruo ^a   Murata, Takanori ^b   Nozoye, Hisakazu ^c  

^a TOPPAN PRINTING CO LTD   (Japan)

^b Shincron Co Ltd   (Japan)

^c NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EVAPORATION; GLASS; LIGHT REFLECTION; MULTILAYERS; SILICA; SUBSTRATES; TITANIUM OXIDES;

LOW-TEMPERATURE DEPOSITION; OXYGEN RADICAL BEAM-ASSISTED EVAPORATION;

OPTICAL FILMS;

EID: 0034502863     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01390-0     Document Type: Article

References (17)

1. Battaglin C., Caccavale F., Menelle A., Montecchi M., Nichelatti E., Nicoletti F. Thin Solid Films. 351:1999;176.
2. Toki K., Kusakabe K., Odani T., Kobuna S., Shimizu Y. Thin Solid Films. 281-282:1996;401.
3. Vergöhl M., Malkomes N., Staedler T., Matthèe T., Richter U. Thin Solid Films. 351:1999;42.
4. Pongratz S., Zöller A. J. Vac. Sci. Technol. A10:1992;1897.
5. Balasubramanian K., Han X.F., Guenther K.H. Appl. Opt. 32:1993;5594.
6. Inagaki N., Tasaka S., Kawai H., Yamada Y. J. Appl. Polym. Sci. 64:1997;831.
7. Grahn J.V., Linder M., Fredriksson E. J. Vac. Sci. Technol. A16:1998;2495.
8. Imai F., Kunimori K., Nozoye H. J. Vac. Sci. Technol. A13:1995;2508.
9. Watanabe S., Nozoye H. Appl. Surf. Sci. 113/114:1997;618.
10. Yamada Y., Uyama H., Watanabe S., Nozoye H. Appl. Opt. 38:1999;6638.
11. Matijasevic V., Garwin E.L., Hammond R.H. Rev. Sci. Instrum. 61:1990;1747.
12. Dehan E., Temple-Boyer P., Henda R., Pedroviejo J.J., Scheid E. Thin Solid Films. 266:1995;14.
13. Yamada Y., Tasaka S., Inagaki N. Jpn. J. Polym. Sci. Technol. 53:1996;53.
14. Leinen D., Espinos J.P., Fernandès A., Gonzalèz-Elipe A.R. J. Vac. Sci. Technol. A12:1994;2728.
15. McCafferty E., Wightman J.P., Frank Cromer T. J. Electrochem. Soc. 146:1999;2849.
16. Strauss G.N., Lechner W., Pulker H.K. Thin Solid Films. 351:1999;53.
17. Schimidt A.A., Offermann J., Anton R. Thin Solid Films. 281/282:1996;105.