SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2542-2548

Mechanical and etching properties of dual ion beam deposited hydrogen-free silicon nitride films

(6) Tsang, M P a Ong, C W a Chong, N a Choy, C L a Lim, P K b Hung, W W b

a HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong)

b HONG KONG BAPTIST UNIVERSITY (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

DENSIFICATION; ELASTIC MODULI; ETCHING; ION BEAMS; ION BOMBARDMENT; IONS; MICROELECTROMECHANICAL DEVICES; SEMICONDUCTING FILMS; SHOT PEENING; SPUTTERING;

DUAL ION BEAM;

SILICON NITRIDE;

EID: 0035442602 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1392397 Document Type: Article

Times cited : (5)

References (37)

1
- 0032164543
- (1998) J. Micromech. Microeng. , vol.8 , pp. 243
- Zhang, T.-Y.¹ Zhang, X.² Zohar, Y.³

2
- 0032306428
- (1998) Thin Solid Films , vol.335 , pp. 97
- Zhang, X.¹ Zhang, T.-Y.² Zohar, Y.³

3
- 0033719568
- (2000) Acta Mater. , vol.48 , pp. 2843
- Zhang, T.-Y.¹ Su, Y.-J.² Qian, C.-F.³ Zhao, M.-H.⁴ Chen, L.-Q.⁵

4
- 0003091077
- edited by S. M. Sze (McGraw-Hill, Singapore)
- (1985) VLSI Technology , pp. 119
- Adams, A.C.¹

5
- 0031130911
- (1997) Thin Solid Films , vol.299 , pp. 104
- Huang, L.¹ Hipps, K.W.² Dickinson, J.T.³ Mazur, U.⁴ Wang, X.D.⁵

6
- 0026221452
- (1991) Thin Solid Films , vol.204 , pp. 77
- Gupta, M.¹ Rathi, V.K.² Thangaraj, R.³ Agnihotri, O.P.⁴ Chari, K.S.⁵

7
- 0016519807
- (1975) J. Electrochem. Soc. , vol.122 , pp. 815
- Mogab, C.J.¹ Petroff, P.M.² Sheng, T.T.³

8
- 0024131194
- (1988) Thin Solid Films , vol.166 , pp. 359
- Ghosh, S.K.¹ Hatwar, T.K.²

9
- 0001388985
- (1998) J. Appl. Phys. , vol.83 , pp. 5831
- Kim, J.H.¹ Chung, K.W.²

10
- 0002114418
- (1976) Thin Solid Films , vol.32 , pp. 11
- Weissmantel, Chr.¹

11
- 33744538097
- (1972) Phys. Rev. B , vol.5 , pp. 4709
- Shirley, D.A.¹

12
- 0026875935
- (1992) J. Mater. Res. , vol.7 , pp. 1564
- Oliver, W.C.¹ Pharr, G.M.²

13
- 0000073841
- (1909) Proc. R. Soc. London, Ser. A , vol.8 , pp. 172
- Stoney, G.G.¹

14
- 0003093598
- Joint Committee for Powder Diffraction Standards, Swathmore, PA, card number 33-1160
- (1975) X-ray powder diffraction files

15
- 0003093598
- Joint Committee for Powder Diffraction Standards, Swarthmore, PA, card number 41-360
- (1975) X-ray powder diffraction files

16
- 0003093598
- Joint Committee for Powder Diffraction Standards, Swarthmore, PA, card number 40-1129
- (1975) X-ray powder diffraction files

17
- 0003427458
- Addison-Wesley, Sydney
- (1978) Elements of X-ray Diffraction, 2nd ed. , pp. 284
- Cullity, B.D.¹

18
- 0003093598
- Joint Committee for Powder Diffraction Standards, Swarthmore, PA, card number 27-1402
- (1975) X-ray powder diffraction files

19
- 0018922738
- (1980) Thin Solid Films , vol.65 , pp. 233
- Erler, H.J.¹ Reisse, G.² Weissmantel, W.³

20
- 0017949035
- (1978) J. Vac. Sci. Technol. , vol.15 , pp. 348
- Wittberg, T.N.¹ Hoenigman, J.R.² Moddeman, W.E.³ Cothern, C.R.⁴ Gulett, M.R.⁵

21
- 29844457849
- (1994) Appl. Phys. Lett. , vol.65 , pp. 2229
- Liao, W.S.¹ Lin, C.H.² Lee, S.C.³

22
- 0026942975
- (1992) Thin Solid Films , vol.220 , pp. 80
- Yoon, J.S.¹ Deshpandey, C.V.² Bunshah, R.F.³

23
- 0031678230
- (1998) MRS Bull. , vol.23 , pp. 22
- Teter, D.M.¹

24
- 0030168370
- (1996) J. Mater. Res. , vol.11 , pp. 1483
- Levy, R.A.¹ Lin, X.² Grow, J.M.³ Boeglin, H.J.⁴ Shalvoy, R.⁵

25
- 0026960770
- (1992) J. Mater. Res. , vol.7 , pp. 3242
- Vlassak, J.J.¹ Nix, W.D.²

26
- 0003278920
- edited by S. M. Sze (McGraw-Hill, Singapore)
- (1985) VLSI Technology , pp. 120
- Adams, A.C.¹

27
- 0019552951
- (1981) Solid State Technol. , vol.APRIL , pp. 167
- Van de Ven, E.¹

28
- 0003160015
- edited by S. M. Sze (McGraw-Hill, Singapore)
- (1985) VLSI Technology , pp. 121
- Adams, A.C.¹

29
- 0017959830
- (1978) J. Appl. Phys. , vol.49 , pp. 2423
- Sinha, A.K.¹ Levinstein, H.J.² Smith, T.E.³

30
- 0017956407
- (1978) J. Electrochem. Soc. , vol.125 , pp. 601
- Sinha, A.K.¹ Levinstein, H.J.² Smith, T.E.³ Quintana, G.⁴ Haszko, S.E.⁵

31
- 0002641876
- (1996) MRS Bull. , vol.21 , pp. 26
- Collins, G.¹ Rej, D.J.²

32
- 84953680409
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 572
- Sun, S.S.¹

33
- 0024607960
- (1989) Nucl. Instrum, Methods Phys. Res. B , vol.37-38 , pp. 787
- Stelmack, L.A.¹ Thurmau, C.T.² Thompson, G.R.³

34
- 0026189827
- (1991) Jpn. J. Appl. Phys., Part 1 , vol.30 , pp. 1469
- Fourrier, A.¹ Bosseboeuf, A.² Bouchier, D.³ Gautherin, G.⁴

35
- 21544431995
- (1987) J. Appl. Phys. , vol.62 , pp. 1800
- Windischmann, H.¹

36
- 0026931424
- (1992) Thin Solid Films , vol.219 , pp. 139
- Jansen, F.¹ Day, A.² Wamboldt, L.³

37
- 0004108476
- Wiley-VCH, Weinheim
- (1999) Etching in Microsystem Technology , pp. 298
- Köhler, J.M.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.