Characterization of a low-frequency inductively coupled plasma source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1096-1101

  Tuszewski, M ^a   Tobin, J A ^a,b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001508839     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580275     Document Type: Article

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