Patterning of polyimide and metal in deep trenches

Sensors and Actuators, A: Physical

Volumn 92, Issue 1-3, 2001, Pages 208-213

  Kutchoukov, V G ^a   Mollinger, J R ^a   Shikida, M ^b   Bossche, A ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Cavities; Coating; Grooves; Metallization; Pattern ing; Photoresist; Polyimide; Recesses; Spinning

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; METALLIZING; PASSIVATION; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; SPIN COATING;

DEEP TRENCHES; METAL INTERCONNECTS; SOFTWARE PACKAGE MICROCAD;

PHOTORESISTS;

EID: 0035425974     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00565-9     Document Type: Article

References (11)

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