SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Applied Physics

Volumn 90, Issue 3, 2001, Pages 1638-1641

Modification of oxidation resistance of copper films by shallow implantation

(3) Zhao, X Q a Han, Y F a Liu, B X b

a BEIJING INSTITUTE OF AERONAUTICAL MATERIALS (China)

b TSINGHUA UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035423447 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1379774 Document Type: Article

Times cited : (13)

References (20)

1
- 0001793582
- J. Li, R. Blewer, and J. W. Mayer, MRS Bull. 18, 18 (1993).
- (1993) MRS Bull. , vol.18 , pp. 18
- Li, J.¹ Blewer, R.² Mayer, J.W.³

2
- 84972048135
- J. M. E. Harper, E. G. Colgan, C-K. Hu, J. P. Hummel, L. P. Buchwalter, and C. E. Uzoh, MRS Bull. 19, 23 (1994).
- (1994) MRS Bull. , vol.19 , pp. 23
- Harper, J.M.E.¹ Colgan, E.G.² Hu, C.-K.³ Hummel, J.P.⁴ Buchwalter, L.P.⁵ Uzoh, C.E.⁶

3
- 84972029133
- J. Li, T. E. Seidel, and J. M. Mayer. MRS Bull. 19, 15 (1994).
- (1994) MRS Bull. , vol.19 , pp. 15
- Li, J.¹ Seidel, T.E.² Mayer, J.M.³

4
- 36449007074
- S. Q. Wang, S. Suter, C. Hoeflich, and B. J. Burrow, J. Appl. Phys. 73, 2301 (1993).
- (1993) J. Appl. Phys. , vol.73 , pp. 2301
- Wang, S.Q.¹ Suter, S.² Hoeflich, C.³ Burrow, B.J.⁴

5
- 0016414208
- H. M. Naguib, R. A. Kriegler, J. A. Davies, and J. B. Mitchell, J. Vac. Sci. Technol. 13, 396 (1976).
- (1976) J. Vac. Sci. Technol. , vol.13 , pp. 396
- Naguib, H.M.¹ Kriegler, R.A.² Davies, J.A.³ Mitchell, J.B.⁴

6
- 0020912797
- L. G. Svendsen, S. S. Eskildsen, and P. Borgesen, Thin Solid Films 110, 237 (1983).
- (1983) Thin Solid Films , vol.110 , pp. 237
- Svendsen, L.G.¹ Eskildsen, S.S.² Borgesen, P.³

7
- 0033149031
- Z. C. Wu, Y. L. Liu, and M. C. Chen, Thin Solid Films 346, 186 (1999).
- (1999) Thin Solid Films , vol.346 , pp. 186
- Wu, Z.C.¹ Liu, Y.L.² Chen, M.C.³

8
- 36449002049
- P. J. Ding, W. A. Landford, S. Hymes, and S. P. Murarka, J. Appl. Phys. 74, 1331 (1993).
- (1993) J. Appl. Phys. , vol.74 , pp. 1331
- Ding, P.J.¹ Landford, W.A.² Hymes, S.³ Murarka, S.P.⁴

9
- 0033889929
- Z. C. Wu, Y. L. Liu, and M. C. Chen, Thin Solid Films 358, 180 (2000).
- (2000) Thin Solid Films , vol.358 , pp. 180
- Wu, Z.C.¹ Liu, Y.L.² Chen, M.C.³

10
- 36449004557
- J. Li, J. W. Mayer, and E. G. Colgan, J. Appl. Phys. 70, 2820 (1991).
- (1991) J. Appl. Phys. , vol.70 , pp. 2820
- Li, J.¹ Mayer, J.W.² Colgan, E.G.³

11
- 0347375168
- P.J. Ding, W. A. Lanford, S. Hymes, and S. P. Murarka, J. Appl. Phys. 75, 3627 (1994).
- (1994) J. Appl. Phys. , vol.75 , pp. 3627
- Ding, P.J.¹ Lanford, W.A.² Hymes, S.³ Murarka, S.P.⁴

12
- 0001651460
- P. J. Ding, W. A. Lanford, S. Hymes, and S. P. Murarka, Appl. Phys. Lett. 65, 1778 (1994).
- (1994) Appl. Phys. Lett. , vol.65 , pp. 1778
- Ding, P.J.¹ Lanford, W.A.² Hymes, S.³ Murarka, S.P.⁴

13
- 0029323574
- W. A. Lanford, P. J. Ding, W. Wang, S. Hymes, and S. P. Murarka, Thin Solid Films 262, 234 (1995).
- (1995) Thin Solid Films , vol.262 , pp. 234
- Lanford, W.A.¹ Ding, P.J.² Wang, W.³ Hymes, S.⁴ Murarka, S.P.⁵

14
- 0041878077
- J. Li, J. W. Mayer, Y. S. Diamond, and E. G. Colgan, Appl. Phys. Lett. 60, 2986 (1992).
- (1992) Appl. Phys. Lett. , vol.60 , pp. 2986
- Li, J.¹ Mayer, J.W.² Diamond, Y.S.³ Colgan, E.G.⁴

15
- 0029327606
- D. Adams, T. L. Alford, N. D. Theodore, S. W. Russell, R. L. Spreitzer, and J. W. Mayer, Thin Solid Films 262, 199 (1995).
- (1995) Thin Solid Films , vol.262 , pp. 199
- Adams, D.¹ Alford, T.L.² Theodore, N.D.³ Russell, S.W.⁴ Spreitzer, R.L.⁵ Mayer, J.W.⁶

16
- 84971176484
- J. Li and J. W. Mayer, MRS Bull. 18, 52 (1993).
- (1993) MRS Bull. , vol.18 , pp. 52
- Li, J.¹ Mayer, J.W.²

17
- 0003412161
- Pergamon, New York
- J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).
- (1985) The Stopping and Range of Ions in Solids
- Ziegler, J.F.¹ Biersack, J.P.² Littmark, U.³

18
- 0004202147
- Plenum, New York
- K. Hauffe, Oxidation of Metals (Plenum, New York, 1965).
- (1965) Oxidation of Metals
- Hauffe, K.¹

19
- 0032093702
- S. K. Lahiri, N. K. W. Singh, K. W. Heng, L. Ang, and L. C. Goh, J. Microelectron. 29, 335 (1998).
- (1998) J. Microelectron. , vol.29 , pp. 335
- Lahiri, S.K.¹ Singh, N.K.W.² Heng, K.W.³ Ang, L.⁴ Goh, L.C.⁵

20
- 0033900789
- S. Y. Lee, S. H. Choi, and C. O. Park, Thin Solid Films 359, 261 (2000).
- (2000) Thin Solid Films , vol.359 , pp. 261
- Lee, S.Y.¹ Choi, S.H.² Park, C.O.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.