Effects of BF2+ implantation on the oxidation resistance of copper films

Thin Solid Films

Volumn 346, Issue 1, 1999, Pages 186-190

  Wu, Zhen Cheng ^a   Liu, Yu Lin ^a   Chen, Mao Chieh ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; COPPER; COPPER COMPOUNDS; DIFFUSION IN SOLIDS; ION IMPLANTATION; OXIDATION RESISTANCE; SEMICONDUCTING FILMS; SILICA;

BORON FLUORIDE;

METALLIC FILMS;

EID: 0033149031     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01609-5     Document Type: Article

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