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Plasma Sources Science and Technology

Volumn 10, Issue 3, 2001, Pages 524-529

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

(4) De Graaf, A a Aldea, E b Dinescu, G b Van De Sanden, M C M a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

b NATIONAL INSTITUTE FOR LASER (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARGON; GRAPHITE; HYDROGENATION; NOZZLES;

THERMAL PLASMA EXPANDING;

PLASMAS;

EID: 0035418415 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/10/3/317 Document Type: Article

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.