메뉴 건너뛰기




Volumn 115, Issue 1, 2001, Pages 446-453

Modification of diffusion coefficients in Mgo(100) through the chemical properties of implanted ions

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; DIFFUSION; ION IMPLANTATION; MAGNESIA; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTALS; TITANIUM;

EID: 0035396328     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1376379     Document Type: Article
Times cited : (8)

References (30)
  • 12
    • 0004576699 scopus 로고    scopus 로고
    • Materials Technology International, 5327 Jacuzzi St., Richmond, CA 94804


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.