|
Volumn 115, Issue 1, 2001, Pages 446-453
|
Modification of diffusion coefficients in Mgo(100) through the chemical properties of implanted ions
a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ANNEALING;
COMPUTER SIMULATION;
DIFFUSION;
ION IMPLANTATION;
MAGNESIA;
SECONDARY ION MASS SPECTROMETRY;
SINGLE CRYSTALS;
TITANIUM;
RADIATION ENHANCED DIFFUSION (RED);
CRYSTAL STRUCTURE;
|
EID: 0035396328
PISSN: 00219606
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1376379 Document Type: Article |
Times cited : (8)
|
References (30)
|