SCOPUS 정보 검색 플랫폼

Volumn 44, Issue 6, 2001, Pages 152-160

Low-temperature annealing system for: 300mm thermal processing

(3) Woo Sik Yoo, a Yamazaki, T a Uchino, T a

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURE OPERATIONS; PHOTORESISTS; PRODUCTIVITY; REFRACTIVE INDEX; SHRINKAGE; SILICON WAFERS; SPIN COATING; THERMAL CONDUCTIVITY; THERMOCOUPLES;

LOW-TEMPERATURE ANNEALING SYSTEMS; STACKED HOTPLATES;

RAPID THERMAL ANNEALING;

EID: 0035367812 PISSN: 0038111X EISSN: None Source Type: Trade Journal
DOI: None Document Type: Article

Times cited : (9)

References (9)

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3
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- Wafer temperature characterization during low temperature annealing
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8
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9
- 0034250096
- SOG annealing keeps its cool
- 17, August
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- Yoo, W.S.¹ Fukada, T.² Yamamoto, J.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.