Properties of reactive magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing

Journal of Materials Science and Technology

Volumn 16, Issue 3, 2000, Pages 281-285

  Chen, Meng ^b   Bai, Xuedong ^a   Gong, Jun ^a   Sun, Chao ^a   Huang, Rongfang ^a   Wen, Lishi ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; SPUTTER DEPOSITION;

HIGH VISIBLE TRANSMITTANCE; INDIUM TIN OXIDE FILMS; LOW RESISTIVITY; REACTIVE SPUTTERING;

THIN FILMS;

EID: 0034187350     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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