Refractive indices change at 633 nm of antimony thin films prepared by heliconwave-plasma sputtering method

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 826-829

  Shima, Takayuki ^a   Kim, Jooho ^a   Tominaga, Junji ^a   Atoda, Nobufumi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ANTIMONY DEPOSITS; DEPOSITION; ELLIPSOMETRY; SPUTTERING; SUBSTRATES; THICKNESS MEASUREMENT;

HELICONWAVE-PLASMA SPUTTERING;

THIN FILMS;

EID: 0035334880     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1368841     Document Type: Article

References (15)