Optimized oxygen plasma etching of polycarbonate for low-loss optical waveguide fabrication

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 5 A, 2001, Pages 3215-3219

  Kang, J W ^a   Kim, J S ^a   Kim, J J ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

Low loss; Optical waveguide; Polycarbonate; Polymer; Reactive ion etching; Thermal stability

Indexed keywords

ATOMIC FORCE MICROSCOPY; FABRICATION; LIGHT POLARIZATION; PLASMA ETCHING; POLYCARBONATES; REACTIVE ION ETCHING; REFRACTIVE INDEX; SPIN COATING; SURFACE ROUGHNESS;

OXYGEN PLASMA ETCHING;

OPTICAL WAVEGUIDES;

EID: 0035328596     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.3215     Document Type: Article

References (21)