Chemical Vapor Deposition of Silicon Carbide/Titanium Carbide Composite Films from Dichlorodimethylsilane, Titanium Tetrachloride, and Methane

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 564-569

  Takeuchi, T ^a,c   Miyoshi, H ^d   Egashira, Y ^b   Komiyama, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; COMPOSITE MATERIALS; DECOMPOSITION; METHANE; SILICON CARBIDE; TITANIUM CARBIDE; TITANIUM COMPOUNDS;

DICHLORODIMETHYLSILANE; TITANIUM TETRACHLORIDE;

CERAMIC COATINGS;

EID: 0033077222     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391644     Document Type: Article

References (35)

1. M. L. Hitchman and K. F. Jensen, Chemical Vapor Deposition, Academic Press, London (1993).
2. M. E. Coltrin, R. J. Kee, and G. H. Evans, J. Electrochem. Soc., 136, 819 (1989).
3. M. D. Allendorf and R. J. Kee, J. Electrochem. Soc., 138, 841 (1991).
4. K. F. Jensen and D. B. Graves, J. Electrochem. Soc., 130, 1950 (1983).
5. L. S. Hong, Y. Shimogaki, Y. Egashira, and H. Koiniyama, J. Electrochem. Soc., 139, 3652 (1992).
6. H. J. Kim, Y. Egashira, and H. Komiyama, J. Chem. Vap. Deposition, 1, 20 (1992).
7. M. Adachi, K. Okuyama, N. Tohge, M. Shimada, J. Satoh, and M. Muroyama, Jpn. J. Appl. Phys., Part 2, 31, L1439 (1992).
8. M. Sasaki and T. Hirai, J. Eur. Ceram. Soc., 14, 257 (1994).
9. Y. Kim, J. T. Choi, J. K. Choi, and K. H. Auh, Mater. Lett., 26, 249 (1996).
10. J. Nakano, K. Fujii, and R. Yamada. J. Am. Ceram. Soc., 80, 2897 (1997).
11. C. Kawai and J. Miyake, J. Ceram. Soc. Jpn., 99, 1088 (1991).
12. C. Kawai, J. Teraki, T. Hirano, and T. Nomura, J. Ceram. Soc. Jpn., 100, 1117 (1992).
13. Y. J. Liu, H. J. Kim, T. Osawa, Y. Egashira, and H. komiyama, Kagaku Kougaku Ranbunsyu, 22, 1429 (1996).
14. J. Schlichting, Powder Metal. Int., 12, 141 (1980).
15. G. S. Fischman and W. T. Petuskey, J. Am. Ceram. Sac., 68, 185 (1985).
16. P. F. Becher, J. Ceram. Soc. Jpn., 99, 993 (1991).
17. M. Sasaki and T. Hirai, J. Ceram. Soc. Jpn., 99, 1002 (1991).
18. G. C. Wei and P. F. Becher, J. Am. Ceram. Soc., 67, 571 (1984).
19. B. W. Lin, T. Yano, and T. Iseki, J. Ceram. Soc. Jpn., 100, 509 (1992).
20. T. Goto and T. Hirai, in 10th International Conference on Chemical Vapor Deposition, G. W. Cullen, Editor, PV 87-8, p. 1070, The Electrochemical Society Proceedings Series, Pennington, NJ (1987).
21. M. Touanen, F. Teyssandier, M. Ducarroir, and J. L. Derep, Mater. Sci. Eng., A147, 239 (1991).
22. M. Maline, R. Hillel, and R. Berjoan, J. Mater. Sci., 27, 6187 (1992).
23. M. Touanen, F. Teyssandier, M. Ducarroir, M. Maline, R. Hillel, and J. L. Derep, J. Am. Ceram. Soc., 76, 1473 (1993).
24. T. T. Lin and M. H. Hon, J. Ceram. Soc. Jpn., 104, 174 (1996).
25. T. Takeuchi, Y. Egashira, T. Osawa, and H. Komiyama, J. Electrochem. Soc., 145, 1277 (1998).
26. D. P. Stinton, W. J. Lackey, R. J. Lauf, and T. M. Besmann, Ceram. Eng. Sci. Prac., 5, 668 (1984).
27. D. P. Stinton and W. J. Lackey, Ceram. Eng. Sci. Proc., 6, 707 (1985).
28. C. Kawai, J. Mater. Sci. Lett., 13, 860 (1994).
29. C. Racault, F. Langlais, R. Naslain, and Y. Kihn, J. Mater. Sci., 29, 3941 (1994).
30. C. Racault, F. Langlais, and C. Bernard, J. Mater. Sci., 29, 5023 (1994).
31. M. Touanen, F. Teyssandier, and M. Ducarroir, J. Mater. Sci. Lett., 8, 98 (1989).
32. T. Tago, M. Kawase, Y. Yoshihara, and K. Hashimoto, J. Electrochem. Soc., 145, 2516 (1998).
33. T. H. Osterheld, M. D. Allendorf, and C. F. Melius, J. Phys. Chem., 98, 6995 (1994).
34. M. D. Allendorf and C. F. Melius, J. Phys. Chem., 97, 720 (1993).
35. J. Phys. Chem. Ref. Data, 14, Suppl. 1 (1985).