Recovery treatments for ion-induced defects in high-quality homoepitaxial CVD diamond

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 322-326

  Endo, S ^a   Kimura, K ^a   Irie, M ^a   Wang, C L ^a   Ito, T ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Damage recovery; Exciton emission; FIB (focused ion beam); High quality diamond; Ion implantation

Indexed keywords

ANNEALING; CATHODOLUMINESCENCE; HYDROGEN; ION IMPLANTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

VACUUM ANNEALINGS;

DIAMOND FILMS;

DIAMOND;

EID: 0035269966     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00591-4     Document Type: Article

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