Absolute quantum photoyield of ion damaged diamond surfaces

Journal of Applied Physics

Volumn 88, Issue 5, 2000, Pages 2451-2454

  Laikhtman, A ^a   Hoffman, A ^a   Kalish, R ^a   Breskin, A ^b   Chechik, R ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DIAMOND FILMS; ELECTRON AFFINITY; PHOTOEMISSION; PLASMA APPLICATIONS; SECONDARY EMISSION;

DIAMOND SURFACES; IMPLANTATION DOSE; MICROWAVE HYDROGEN PLASMAS; PARTIAL RECOVERY; PHOTOEMISSION PROPERTIES; POLYCRYSTALLINE DIAMOND FILMS; SECONDARY ELECTRON EMISSION MEASUREMENT; SPECTRAL RANGE;

ION BOMBARDMENT;

EID: 0000609214     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1287528     Document Type: Article

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