Slant slot antenna-type electron cyclotron resonance plasma source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 5021-5027

  Watanabe, Seiichi ^a   Tamura, Hitoshi ^a   Sumiya, Masahiro ^a   Furuse, Muneo ^a   Kawasaki, Sunao ^b  

^a HITACHI LTD   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

Electron cyclotron resonance; Etching; Microwave; Plasma; Semiconductor; Wafer

Indexed keywords

CURRENT DENSITY; ELECTRIC CURRENT DISTRIBUTION; ELECTRIC DISCHARGES; ELECTRIC FIELDS; ELECTRON CYCLOTRON RESONANCE; ETCHING; IONS; MICROWAVES; SEMICONDUCTOR MATERIALS;

ELECTRIC FIELD DISTRIBUTION; ION SATURATION CURRENT DENSITY; SLANT SLOT ANTENNA;

PLASMA SOURCES;

EID: 0032155285     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5021     Document Type: Article

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