SCOPUS 정보 검색 플랫폼

Volumn 4409, Issue , 2001, Pages 1-11

The new mask technology challenges

Author keywords

Mask challenges; Mask cost; Mask cycle time; Mask industry; Mask specifications; Mask technology

Indexed keywords

COST EFFECTIVENESS; ELECTRONICS INDUSTRY; INTEGRATED CIRCUIT MANUFACTURE; INVESTMENTS; MASKS; RISKS;

MASK INDUSTRY; MASK TECHNOLOGY;

PHOTOLITHOGRAPHY;

EID: 0035189877 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.438408 Document Type: Conference Paper

Times cited : (2)

References (6)

1
- 0003996557
- The end of Moore's Law?
- internet published; May/June
- (2000)
- Mann, C.C.¹

2
- 0000488829
- Cost of ownership for soft-X-ray projection lithography
- (1993) SPIE Photomask Technology and Management , vol.2087 , pp. 340-349
- Early, K.E.¹ Arnold, W.H.²

3
- 0028742281
- Cost of ownership for x-ray proximity lithography
- (1994) SPIE , vol.2194 , pp. 22-33
- Early, K.E.¹ Arnold, W.H.²

4
- 0033671666
- A new photomask pattern generation method based on I-line stepper
- Photomask and Next-Generation Lithography Mask Technology VII, Hiroaki Morimoto, Editor
- (2000) Proceedings of SPIE , vol.4066 , pp. 631-640
- Kyoh, S.¹ Tanaka, S.² Inoue, S.³ Higashikawa, I.⁴ Mori, I.⁵ Okumura, K.⁶ Irie, N.⁷ Muramatus, K.⁸ Ishii, Y.⁹ Magome, N.¹⁰ Umatate, T.¹¹

5
- 0033666534
- New concept I-line stepper for mask fabrication
- Photomask and Next-Generation Lithography Mask Technology VII, Hiroaki Morimoto, Editor
- (2000) Proceedings of SPIE , vol.4066 , pp. 641-648
- Irie, N.¹ Muramatsu, K.² Ishii, Y.³ Magnome, N.⁴ Umatate, T.⁵ Kyoh, S.⁶ Tanaka, S.⁷ Inoue, S.⁸ Higashikawa, I.⁹ Mori, I.¹⁰ Okumura, K.¹¹

6
- 0033671664
- Pattern shape analysis tool for defect judgement of photomask
- Photomask and Next-Generation Lithography Mask Technology VII, Hiroaki Morimoto, Editor
- (2000) Proceedings of SPIE , vol.4066 , pp. 356-367
- Matsuo, F.¹ Otaki, M.² Fujugami, N.³ Yonekura, I.⁴ Fukushima, Y.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.