Pattern shape analysis tool for defect judgement of photomask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 356-367

  Matsuo, Fuyuhiko ^a   Otaki, Masao ^a   Fukugami, Norihito ^a   Yonekura, Isao ^a   Fukushima, Yuichi ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFECTS; IMAGE PROCESSING; INSPECTION; PHOTOLITHOGRAPHY; QUALITY ASSURANCE; SCANNING ELECTRON MICROSCOPY;

DEFECT INSPECTION; OPTICAL FLUX; OPTICAL PROXIMITY CORRECTION; PATTERN SHAPE ANALYSIS TOOL; PHOTOMASK;

MASKS;

EID: 0033671664     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392036     Document Type: Conference Paper

References (0)