New photomask pattern generation method based on i-line stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 631-640

  Kyoh, S ^a   Tanaka, S ^a   Inoue, S ^a   Higashikawa, I ^a   Mori, I ^a   Okumura, K ^a   Irie, N ^a   Muramatsu, K ^a   Ishii, Y ^a   Magome, N ^a   Umatate, T ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; MICROPROCESSOR CHIPS; OPTICAL DEVICES; OPTICAL VARIABLES CONTROL; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SPECIFICATIONS;

CRITICAL DIMENSION ERROR; I-LINE STEPPER; PATTERN PLACEMENT ERROR; PHOTOMASK REPEATER;

MASKS;

EID: 0033671666     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392096     Document Type: Conference Paper

References (6)