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Volumn 4066, Issue , 2000, Pages 641-648
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New concept i-line stepper for mask fabrication
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Author keywords
[No Author keywords available]
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Indexed keywords
DYNAMIC RANDOM ACCESS STORAGE;
INTEGRATED CIRCUIT LAYOUT;
INTEGRATED CIRCUIT MANUFACTURE;
MICROPROCESSOR CHIPS;
PHOTOLITHOGRAPHY;
PRODUCTIVITY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR DEVICE MANUFACTURE;
SPECIFICATIONS;
CRITICAL DIMENSION UNIFORMITY;
GRADATION FILTER;
STEPPER;
STITCHING;
SYSTEM ON CHIP;
TURN AROUND TIME;
MASKS;
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EID: 0033666534
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.392077 Document Type: Conference Paper |
Times cited : (11)
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References (3)
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