Chemical vapor deposition of diamond films in hot filament reactor

Crystal Research and Technology

Volumn 36, Issue 8-10, 2001, Pages 961-970

  Grus, M ^a   Jankowska Frydel, A ^a   Bohdanowicz, J ^a   Zawada, K ^b  

^a UNIVERSITY OF GDA SK   (Poland)

^b UNIVERSITY OF WARSAW   (Poland)

Author keywords

Crystal defects; CVD method; Diamond film; EPR; Raman spectrum; SEM

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; CRYSTAL DEFECTS; HYDROCARBONS; PARAMAGNETIC RESONANCE; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

FILAMENT REACTORS;

DIAMOND FILMS;

EID: 0035165540     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4079(200110)36:8/10<961::AID-CRAT961>3.0.CO;2-F     Document Type: Conference Paper

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