Preparation of high quality transparent chemical vapor deposition diamond films by a DC arc plasma jet method

Diamond and Related Materials

Volumn 9, Issue 9, 2000, Pages 1678-1681

  Guofang, Zhong ^a   Fazheng, Shen ^a   Weizhong, Tang ^a   Fanxiu, Lu ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FILM PREPARATION; METHANE; PLASMA JETS; PRESSURE EFFECTS; PYROMETERS; THERMAL EFFECTS; TRANSPARENCY;

CHAMBER PRESSURE; FREE STANDING; PROCESS PARAMETERS; SUBSTRATE TEMPERATURE; SUPERSATURATED ATOMIC HYDROGEN;

DIAMOND FILMS;

EID: 0034274913     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00311-3     Document Type: Article

References (9)

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3. F.X. Lu G.F. Zhong J.G. Sun A new type of DC arc plasma torch for low cost large area diamond deposition. Diamond 1997, paper No. 9.004, Edinburgh, UK, August 3–8, 1997 Diamond Relat. Mater. 7 1998 737
4. H. Windischmann K.J. Gray Stress measurement of CVD diamond films Diamond Relat. Mater. 4 1995 837
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7. W. Piekarczyk Diamond-vapour interface and processes proceeding on it during growth of diamond crystals I. Diamond (111) face J. Cryst. Growth 119 1992 345
8. M.H. Loh M.A. Cappelli Supersonic DC-arcjet synthesis of diamond Diamond Relat. Mater. 2 1993 454
9. Z. Guofang L. Fanxiu L. Huiqi High rate deposition of diamond films in Ar-H2-liquified petroleum gas system Thin Film Sci. Technol. 7 2 1994 109 (in Chinese)