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Volumn 41, Issue 2, 2001, Pages 193-199

Unifying the thermal-chemical and anode-hole-injection gate-oxide breakdown models

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; ELECTRON TRANSITIONS; HOLE TRAPS; REACTION KINETICS; SEMICONDUCTOR DEVICE MODELS;

EID: 0035129983     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(00)00203-1     Document Type: Article
Times cited : (12)

References (20)
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    • 2 thin-films and their impact on time dependent dielectric breakdown
    • 2 thin-films and their impact on time dependent dielectric breakdown. IEEE Inter Reliab Phys Symp (IRPS) 1998:47.
    • (1998) IEEE Inter Reliab Phys Symp , Issue.IRPS , pp. 47
    • McPherson, J.W.1    Mogul, H.C.2
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    • Field and temperature acceleration model for time-dependent dielectric breakdown
    • Kimura M. Field and temperature acceleration model for time-dependent dielectric breakdown. IEEE Trans Electron Dev. 46(1):1999;220.
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    • Kimura, M.1
  • 9
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    • A unified gate oxide reliability model
    • Hu C, Lu Q. A unified gate oxide reliability model. IRPS 1999:47.
    • (1999) IRPS , pp. 47
    • Hu, C.1    Lu, Q.2
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  • 11
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    • Field dependence of two large hole capture cross sections in thermal oxide on silicon
    • Tzou J.J., Sun J.Y.-.C., Sah C.-.T. Field dependence of two large hole capture cross sections in thermal oxide on silicon. Appl Phys Lett. 43(9):1983;861.
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    • Tzou, J.J.1    Sun, J.Y.-C.2    Sah, C.-T.3
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    • Photo-carrier generation as the origin of Fowler-Nordheim-induced substrate hole current in thin oxides
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    • (1999) Int Electron Dev Meeting (IEDM) , pp. 465
    • Rasras, M.1
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.