Micropipe filling by the sublimation close space technique

Materials Science Forum

Volumn 353-356, Issue , 2001, Pages 73-76

  Furusho, T ^a   Ohshima, S ^a   Nishino, S ^a  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; FILLING; PROBABILITY; SUBLIMATION;

CLOSE SPACE TECHNIQUE; MICROPIPE FILLING; OFF-AXIS ANGLE; ON-AXIS ANGLE; SUBLIMATION EPITAXY;

SILICON CARBIDE;

EID: 0035127041     PISSN: 02555476     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.4028/www.scientific.net/msf.353-356.73     Document Type: Article

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