Essential aspects of chemical mechanical planarization for oxide semiconductor

Key Engineering Materials

Volumn 196, Issue , 2001, Pages 1-24

  Hocheng, H ^a   Tsai, H Y ^b   Huang, Y L ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL PLANARIZATION; PRESTON EQUATION;

CHEMICAL POLISHING; KINEMATICS; MATHEMATICAL MODELS; SEMICONDUCTOR DEVICE MANUFACTURE;

VLSI CIRCUITS;

EID: 0035124634     PISSN: 10139826     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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