Pattern Planarization Model of Chemical Mechanical Polishing

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 744-748

  Chen, Dar Zen ^a   Lee, Bor Shin ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; KINEMATICS; MATHEMATICAL MODELS;

CHEMICAL MECHANICAL POLISHING; PATTERN PLANARIZATION MODEL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033076595     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391674     Document Type: Article

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