Abrasive capacity of thin film diamond structures

Key Engineering Materials

Volumn 196, Issue , 2001, Pages 141-148

  Andersson, J ^a   Hollman, P ^a   Jacobson, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; ALUMINA; BRASS; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; ELECTROPLATING; GRINDING (MACHINING); NICKEL PLATING; SILICON NITRIDE; SILICON WAFERS; STEEL; WEAR OF MATERIALS;

THREE STEP REPLICATION TECHNIQUE;

DIAMOND FILMS;

EID: 0035121239     PISSN: 10139826     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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2. W. Kulisch, A. Malave, G. Lippold, W. Scholz, C. Mihalcca and E. Oesterschulze, Diamond and Related Materials, 6 (1997) 906-911.
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5. K. E. Bean, IEEE Transactions on Electron Devices, ED-25 (1992) 1185-1193.
6. H. Björkman, P. Rangsten, U. Simu, J. Karlsson, P. Hollman and K. Hjort, Diamond microstructure replicas from silicon masters, Proc. of The Eleventh Annual International Workshop on Micro Electro Mechanical System, Hedelberg, Germany (1998) pp.34-39.
7. th Sept. 1998.
8. T. D. Moustakas, in Synthetic Diamond: Emerging CVD Science and Technology, ed. K. E. Spear and J. P. Dismukes (John Wiley & Sons, Inc., New York) (1994) pp.149.