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Volumn 88, Issue 1, 2001, Pages 87-90

Novel refractive silicon microlens array using bulk micromachining technology

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); DIFFRACTION; DIFFUSION IN SOLIDS; ETCHING; INFRARED RADIATION; MICROMACHINING; PHOTORESISTS; REFRACTIVE INDEX; SILICON WAFERS;

EID: 0035121035     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00493-3     Document Type: Article
Times cited : (30)

References (16)
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    • Yoshita M., Sasaki T., Baba M., Akiyama H. Application of solid immersion lens to high-spatial resolution photoluminescence imaging GaAs quantum wells at low temperature. Appl. Phys. Lett. 73:1998;635-637.
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    • Yoshita, M.1    Sasaki, T.2    Baba, M.3    Akiyama, H.4
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    • Microlens arrays etched into glass and silicon
    • Savander P. Microlens arrays etched into glass and silicon. Opt. Lasers Eng. 20:1994;97-107.
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    • Savander, P.1
  • 8
    • 0001140618 scopus 로고    scopus 로고
    • Transferring resist microlenses into silicon by reactive ion etching
    • Eisner M., Schwider H. Transferring resist microlenses into silicon by reactive ion etching. Opt. Eng. 35(10):1996;2979-2982.
    • (1996) Opt. Eng. , vol.35 , Issue.10 , pp. 2979-2982
    • Eisner, M.1    Schwider, H.2
  • 9
    • 0028739183 scopus 로고
    • High performance near room-temperature 2-12 μm photodetectors
    • Piotrowski J. High performance near room-temperature 2-12 μm photodetectors. SPIE'94. 2225:1994;166-173.
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    • Application to microlens to infrared detector arrays
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.