Orientation control and electrical properties of sputtered Pb(Zr,Ti)O3 films

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 79, Issue 1, 2001, Pages 86-89

  Lee, Jeong Young ^a   Lee, Byung Soo ^a  

^a Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; FILM PREPARATION; LEAD COMPOUNDS; MAGNETIC HYSTERESIS; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; REMANENCE; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

ATOMIC MOBILITY; FERROELECTRIC THIN FILMS;

DIELECTRIC FILMS;

EID: 0035094526     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(00)00555-9     Document Type: Article

References (16)

1. Sumi T., Judai Y., Hirano K., et al. Jpn. J. Appl. Phys. 35:1996;1516.
2. Kotechi David E. Intergrat. Ferroelectr. 16:1997;1.
3. Aoki K., Fukuda Y., Numata K., Nishimura A. Jpn. J. Appl. Phys. 33:1994;5155.
4. Brooks K.G., Klissurska R.D., Moechli P., Setter N. J. Mater. Res. 12:1997;531.
5. Sakurai A., Shiratsuyu K., Takagi H., Sakabe Y. Jpn. J. Appl. Phys. 36:1997;5812.
6. Shimizu M., Sugiyama M., Jujisawa H., Shiosaki T. Jpn. J. Appl. Phys. 33:1994;5167.
7. Nahimoto K., Nakamura S. Jpn. J. Appl. Phys. 33:1994;5147.
8. Hwang C.S., Park S.O., Cho H.J., Kang C.S., Kang H.K., Lee S.I., Lee M.Y. Appl. Phys. Lett. 67:1995;2819.
9. B. Campman, Glow discharge processes, New York, Chichester, Brisbane, Toronto, Singapore, 1980, p. 201.
10. Kim C.J., Yoon D.S., Lee J.S., Choi C.G., No K. J. Mater. Res. 12:1997;1043.
11. Gardeniers J.G.E., Elwenspoek M., Cobianu C. Mater. Res. Soc. Symp. Proc. 343:1994;451.
12. Cattan E., Velu G., Jaber B., Remiens D., Thierry B. Appl. Phys. Lett. 70:1997;1718.
13. Hase T., Hirata K., Amanuma K., Hosokawa N., Miyasaka Y. Jpn. J. Appl. Phys. 33:1994;5244.
14. Chernov A.A., Civargizov E.I., Bagdasarov K.S., Kuznetsov V.A., Demianets L.N., Lobachev A.N. Modern Crystallography III. 1984;9-17 Springer-Verlag, Berlin, Heidelberg/New York, Tokyo.
15. Yang K.D., Cho H.J., Cho H.S., Kim H.J. J. Korean Ceramic Society. 32:1995;441.
16. Brennan Ciaran J. Intergrat. Ferroelectr. 2:1992;73.