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Volumn 19, Issue 1, 2001, Pages 268-274

Mechanism of nonideality in nearly ideal Si Schottky barriers

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON EMISSION; ELECTRON MICROSCOPY; ENERGY GAP; FERMI LEVEL; INTERFACES (MATERIALS); IONIZATION; POINT DEFECTS; SEMICONDUCTING SILICON;

EID: 0035078596     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1343101     Document Type: Article
Times cited : (11)

References (40)
  • 14
    • 0002916959 scopus 로고
    • edited by J. M. Poate, K. N. Tu, and J. W. Mayer Wiley, New York
    • K. N. Tu and J. W. Mayer, in Thin Films - Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer (Wiley, New York, 1978), p. 359.
    • (1978) Thin Films - Interdiffusion and Reactions , pp. 359
    • Tu, K.N.1    Mayer, J.W.2
  • 19
    • 0042521197 scopus 로고
    • H. Palm, M. Arbes, and M. Schulz, Phys. Rev. Lett. 71, 2224 (1993); Appl. Phys. A: Solids Surf. 56, 1 (1993).
    • (1993) Appl. Phys. A: Solids Surf. , vol.56 , pp. 1
  • 36
    • 1642549748 scopus 로고    scopus 로고
    • The sign of δφ defined by Eq. (3) is reversed from that of Refs. 19 and 20 for a convenience of discussion
    • The sign of δφ defined by Eq. (3) is reversed from that of Refs. 19 and 20 for a convenience of discussion.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.