Process variation analysis for MEMS design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4236, Issue , 2001, Pages 272-279

  Schenato, L ^a   Wu, W C ^a   El Ghaoui, L ^a   Pister, K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

CAD; Monte Carlo algorithm; Nodal analysis; Performance bounds; Process variation; Robust optimization; SDP

Indexed keywords

ALGORITHMS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; MONTE CARLO METHODS; OPTIMIZATION; PROBABILISTIC LOGICS; PROBABILITY DISTRIBUTIONS; PROGRAMMING THEORY; SAMPLING;

NODAL ANALYSIS; SEMIDEFINITE PROGRAMMING (SDP);

MICROELECTROMECHANICAL DEVICES;

EID: 0034989831     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.418766     Document Type: Conference Paper

References (15)

1. Robust semidefinite programming
2. MEMS simulation using SUGAR v0.5
3. Robust solutions to uncertain semidefinite programs
4. Structured design of integrated MEMS
5. Confidence ellipsoids for uncertain linear equations with structure
6. LMIT00L: A package for LMI optimization
7. Generating efficient dynamical models for microelectromechanical systems from a few finite-element simulation runs
8. Introduction to Monte Carlo methods
9. Optimization-based synthesis of microresonators
10. Interior-point polynomial methods in convex programming
11. CAD challenges for microsensors, microactuators, and microsystems
12. Fast algorithms for 3-D simulation