Deposition of cubic boron nitride layers - Characterisation of substrate-layer interface

Thin Solid Films

Volumn 301, Issue 1-2, 1997, Pages 65-70

  Barth, K L ^a   Sigle, W ^b   Stockle D ^a   Ulmer, J ^a   Lunk, A ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Boron nitride; Fourier transform infrared spectroscopy; Growth mechanism; Transmission electron microscopy

Indexed keywords

CATHODES; FILM GROWTH; INTERFACES (MATERIALS); MULTILAYERS; SPUTTERING; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

HOLLOW CATHODE ARC EVAPORATION; HOLLOW CATHODES;

CUBIC BORON NITRIDE;

EID: 0031153227     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00058-8     Document Type: Article

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