Chemical mechanical polishing (CMP) in magnetic float polishing (MFP) of advanced ceramic (silicon nitride) and glass (silicon dioxide)

Key Engineering Materials

Volumn , Issue 202-203, 2001, Pages 1-14

  Jiang, M ^a   Komanduri, R ^a  

^a Oklahoma State University   (United States)

Author keywords

Chemical Mechanical Polishing (CMP); High Speed Bearing; Magnetic Float Polishing (MFP); Silicon Dioxide; Silicon Nitride

Indexed keywords

ABRASIVES; BEARINGS (MACHINE PARTS); CHEMICAL MECHANICAL POLISHING; GLASS; SILICA; SILICON NITRIDE;

HIGH SPEED BEARINGS; MAGNETIC FLOAT POLISHING (MFP);

CERAMIC MATERIALS;

EID: 0034968141     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Article

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