Curvilinear-axis focusing and aberration theory of wide electron beams for combined immersion magnetic-electrostatic lens systems

Optik (Jena)

Volumn 112, Issue 6, 2001, Pages 259-267

  Cheng, M I N ^a   Tang, Tiantong ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Combined immersion magnetic electrostatic lenses; Curvilinear axis aberrations; Curvilinear axis electron optics

Indexed keywords

ABERRATIONS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTROSTATIC LENSES; FOCUSING; MAGNETIC LENSES; MATHEMATICAL PROGRAMMING; PARTIAL DIFFERENTIAL EQUATIONS; PROJECTION SYSTEMS; VECTORS;

COMBINED IMMERSION MAGNETIC ELECTROSTATIC LENSES; CURVILINEAR AXIS THEORY; EULER EQUATIONS;

ELECTRON OPTICS;

EID: 0034882245     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: 10.1078/0030-4026-00053     Document Type: Article

References (11)

1. Scattering with angular limitation projection electron beam lithography for suboptical lithography
2. Space charge effects in projection charge particle lithography systems
3. Electron beam lithography for 0.13 μm manufacturing
4. Lithography beyond 0.13 μm
5. Study on wide beam curved optical axes focusing for magnetic immersed lenses without crossovers
6. Elektronen- und Ion-Optik