Computational synthesis of lithographic mask layouts for silicon microcomponents

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4407, Issue , 2001, Pages 126-134

  Buttgenbach S ^a   Hansen, U ^a   Steffensen, L ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Etch simulation; Genetic algorithm; Layout synthesis; Microsystems

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; ETCHING; GENETIC ALGORITHMS; LITHOGRAPHY; MICROMACHINING; SEMICONDUCTING SILICON;

LITHOGRAPHIC MASK LAYOUTS;

MASKS;

EID: 0034839210     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425292     Document Type: Conference Paper

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