A FIB micro-sampling technique and a site-specific TEM specimen preparation method for precision materials characterization

Materials Research Society Symposium-Proceedings

Volumn 636, Issue , 2001, Pages D9351-D9356

  Yaguchi, Toshie ^a,b   Urao, Ryoichi ^a   Kamino, Takeo ^b   Ohnishi, Tsuyoshi ^b   Hashimoto, Takahito ^b   Umemura, Kaoru ^b   Tomimatsu, Satoshi ^b  

^a IBARAKI UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMANIPULATORS; MICROPROCESSOR CHIPS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

FOCUSED ION-BEAMS (FIB);

SEMICONDUCTOR DEVICES;

EID: 0034818170     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)