Field emission from silicon microstructures formed by femtosecond laser assisted etching

Conference on Lasers and Electro-Optics Europe - Technical Digest

Volumn , Issue , 2001, Pages 555-556

  Carey, J E ^a   Zhao, L ^a   Wu, C ^a   Mazur, E ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC POTENTIAL; ELECTRODES; ETCHING; LASER BEAM EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; ULTRASHORT PULSES;

FIELD EMISSION ARRAYS;

ELECTRON EMISSION;

EID: 0034812310     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/cleo.2001.948159     Document Type: Conference Paper

References (7)